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COATINGS : AN INTRODUCTION TO THE CLEANING PROCEDURES
by William
R. BIRCH
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Companies
- Crest
Ultrasonics
Complete
line of ultrasonic cleaning equipment and chemistries
- Millipore
Filters and other engineering products and services for
cleaning fluids and
materials.
- Labwater.com
Laboratory water
purification products. Replacement filters and membranes for
most laboratory water systems. Complete laboratory water
purification systems
- Nalgene
Brand Labware
The complete NALGENE Product Catalog online
- Unisil
Corp.
- BYK-Chemie
Additives for Coatings and Paints
Chemicals & Hazards
Cleaning techniques
- UV-Ozone
cleaning (pdf file 3 Mo)
by John Vig 45 pages, 175 references. (pdf file 3Mo)
Chapter 6 of "Handbook of semiconductor wafer cleaning
technology. Science, Technology & Applications" Ed.
by W. Kern, Noyes Publications, 1993
The UV/Ozone cleaning procedure has been shown to be a
highly effective method of removing a variety of
contaminants from silicon and compound semiconductor wafers,
as well as from many other types of surface. John Vig
describes here the technique, the underlying mechanisms, the
variables involved, safety considerations and details for
construction of a UV/Ozone cleaning facility. 45 pages, 175
references.
Copyright notice
Although the book in which this chapter appears is
copyrighted, the author is an employee of the U.S.
Government and performed this work as part of his official
duties. The work is, therefore, not subject to copyright
protection by the publisher.
- Uvocs
UV/Ozone cleaning
-
Advanced
Plasma Surface Cleaning Techniques (Introduction)
From
ONRL National Laboratory
-
Plasma
for cleaning & etchning
- Plasma
Cleaning and Drying: Alternatives to Conventional Technologies
Online paper by Mario A. Hozbor, Andreo C. Greene,1994
- Plasma
cleaning: Suppliers list
From Powesourcing.com
- Laser
cleaning suppliers list
From Micromagazine.com Buyers Guide
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