|
| PRECURSORS
|
H2C=C(CH3)CO2(CH2)Si(OCH3)
H2C=C(CH3)COOH
Zr(OPr)4
|
MAPTMS
MAA
ZPO |
SUBSTRATE
: Si + SiO2
WAVEGUIDE MANUFACTURING (1st approach) :
| Dipping |
UV exposure |
Etching |
Over cladding |
WAVEGUIDE MANUFACTURING (2nd approach) :
| Dipping |
UV exposure |
Curing |
Over cladding |
|
WAVEGUIDE CHARACTERISTICS:
|
-
Waveguide size:
-
Core refractive index
-
Clad refractive index
-
Core roughness
-
Passive loss
(1.3µm)
|
4x7 µm²
1.52
1.42
± 10 nm
0.13 dB/cm |
BRAGG
Gratings manufacturing
| RESEARCH GROUP IN
THE FIELD |
|
|
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