Objective:
- Preparation of homogeneous metal sulfide thin films deposited on various substrates
using wet-coating techniques (spin-, spray-coating)
Methods:
- Deposition of a single-source precursor from solution by the spin- or spray-coating
technique on glass-, steel-, and ceramic-substrates
- Drying of the coating in air at temperatures below 350°C
- Thermal treatment under inert or reducing atmosphere at temperatures between 300 and
800°C
- Method can be extended to the preparation of MoSe2, WS2, WSe2,
and other sulfides and selenides (e.g. Sb, As, Ge, Sn, V, etc.)
- Preparation of
a-Mo2C- and Mo5N6-thin films by conversion under
forming gas and NH3, respectively
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MoSx coatings:
- Homogeneous films with a bright metallic luster and a brownish transmission
- Variable S- and C-content depending on the thermal treatment
- Film thickness up to 600 nm for amorphous MoS3 coatings and up to
300 nm for microcrystalline MoS2
- Optical parameters after 600°C heat treatment
- absorption coefficient
a550 » 2´105 cm-1
- direct bandgap Eg,d » 1.8 eV
- Friction coefficient µ < 0.1 on stainless steel
(in air)
Applications:
- Semiconducting coatings
- Low friction coatings
- Li+-ion storage, e.g. in Li-batteries
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Laboratory Technology
